• English
  • Deutsch
  • Log In
    Password Login
    Research Outputs
    Fundings & Projects
    Researchers
    Institutes
    Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Konferenzschrift
  4. Novel in-line inspection method for non-visual defects and charging
 
  • Details
  • Full
Options
2009
Conference Paper
Title

Novel in-line inspection method for non-visual defects and charging

Abstract
Surface potential difference (SPD) measurements have shown to be effective in in-line characterizing charging non-uniformity and non-visual residues for both process and tool development but also in in-line characterizing properties of ultra thin transistor work function layers.
Author(s)
Höppner, K.
Manuwald, R.
Fahr, T.
Zschech, Ehrenfried
Fraunhofer-Institut für Keramische Technologien und Systeme IKTS  
Tamayo, N.
Hickson, J.
Adrian, B.
Newcomb, R.
Mainwork
IEEE/SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2009  
Conference
Advanced Semiconductor Manufacturing Conference (ASMC) 2009  
DOI
10.1109/ASMC.2009.5155979
Language
English
Fraunhofer-Institut für Keramische Technologien und Systeme IKTS  
Keyword(s)
  • cmos integrated circuits

  • inspection

  • integrated circuit measurement

  • semiconductor industry

  • field effect transistors

  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Contact
© 2024