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  4. 1550 nm High Power Broad Area Laser with InGaAlAs-MQWs as active Material and Al-free Facets
 
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2025
Conference Paper
Title

1550 nm High Power Broad Area Laser with InGaAlAs-MQWs as active Material and Al-free Facets

Abstract
NIR-semiconductor lasers with an emission wavelength beyond 1300 nm are of crucial interest for a wide range of industrial and medical applications such as plastics welding and surgery [1]. For such lasers the InPmaterial system is the well proven candidate of choice. We already demonstrated a 1550 nm broad area laser with a 20°C optical output power as high as 4.9 W in CW mode by using strained InGaAsP quantum wells (QW) as active material [2]. InGaAlAs QWs could potentially offer an enhanced performance at elevated operation temperatures because of a stronger confinement of the electrons due to the potentially larger conduction band offset [3]. Unfortunately, the facets of Al-containing QWs tend to degrade quickly when being exposed to air. In particular but not exclusively for high power devices this becomes a severe problem causing catastrophic optical damage (COD). Cleaving in UHV and sophisticated cleaning technics prior to mirror coating [4] reduce the degradation, but come with significant expense.
Author(s)
Kanold, Niklas
Fraunhofer-Institut für Nachrichtentechnik, Heinrich-Hertz-Institut HHI  
Moehrle, Martin  
Fraunhofer-Institut für Nachrichtentechnik, Heinrich-Hertz-Institut HHI  
Schell, Martin  
Fraunhofer-Institut für Nachrichtentechnik, Heinrich-Hertz-Institut HHI  
Mainwork
Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference, CLEO/Europe-EQEC 2025  
Conference
Conference on Lasers and Electro-Optics Europe 2025  
European Quantum Electronics Conference 2025  
DOI
10.1109/CLEO/EUROPE-EQEC65582.2025.11111167
2-s2.0-105033346909
Language
English
Fraunhofer-Institut für Nachrichtentechnik, Heinrich-Hertz-Institut HHI  
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