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  4. Methods of vacuum arc deposition of ta-C films
 
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2018
Book Article
Title

Methods of vacuum arc deposition of ta-C films

Abstract
Vacuum arc discharges yield plasmas with usually complete ionization, high energy of the ions and high ion currents.
Author(s)
Schultrich, Bernd  
Fraunhofer-Institut für Werkstoff- und Strahltechnik IWS  
Mainwork
Tetrahedrally Bonded Amorphous Carbon Films I  
DOI
10.1007/978-3-662-55927-7_10
Language
English
Fraunhofer-Institut für Werkstoff- und Strahltechnik IWS  
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