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  4. A Process Flow and Time Model for Planning and Manufacturing Control
 
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2000
Conference Paper
Title

A Process Flow and Time Model for Planning and Manufacturing Control

Abstract
Within the wafer fabrication process a raw wafer goes through a complex process flow of 150 to 900 different process steps, which are processed on around 100 different equipment families each associated with a group of physical equipments. Each single process step is interrelated with a variety of technological and logistical data. A state of the art IC-manufacturer has to manage up to several hundreds of process flows in order to manufacture its products. This paper presents 2 models by which the complex data objects and interrelationships making up a semiconductor process flow are specified: a Process Flow Model containing object structures for process flows, process groups and process steps and a Time Model containing object structures for describing the behavior of process flows and equipments in respect to time. The models can be used as a development base for future Information Technology (IT) systems (e.g. MES systems) which have to manage complex process flow data for semiconductor manufacturing.
Author(s)
Frauenhoffer, F.
Mainwork
SEMICON Europa 2000. European IEEE/SEMI Semiconductor Manufacturing Conference. Technical programs for the semiconductor and flat panel display equipment and materials industries  
Conference
European Semiconductor Manufacturing Conference (SEMICON Europa) 2000  
Advanced Semiconductor Manufacturing Conference and Workshop (ASMC) 2000  
International Symposium on Semiconductor Manufacturing (ISSM) 2000  
Language
English
Fraunhofer-Institut für Produktionstechnik und Automatisierung IPA  
Keyword(s)
  • Zeitmanagement

  • wafer fabrication

  • Fertigungssteuerung

  • Fertigungsplanung

  • Fertigungsprozeß

  • Halbleiter

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