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Measurement data evaluation for in situ single-wavelength ellipsometry during reactive ion etching
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2004
Presentation
Title
Measurement data evaluation for in situ single-wavelength ellipsometry during reactive ion etching
Title Supplement
Presentation held at the 5th European AEC/APC Conference. Dresden, Germany, April 14-16, 2004
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Author(s)
Roeder, G.
Schneider, C.
Pfitzner, L.
Ryssel, H.
Conference
European Advanced Equipment Control / Advanced Process Control Conference (AEC/APC Europe) 2004
DOI
10.24406/publica-fhg-344627
File(s)
001.pdf (632.95 KB)
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Rights
Under Copyright
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB