High-periodicity nanostructures on a thermally cross-linkable copolymer

This paper presents a low-cost and high-throughput process for nanoscale imprinting of a novel thermally cross-linkable polymer via laser interference lithography. This technique was applied to produce the highly periodic nanometer structures such as lines and dots. The negative of this master pattern was imprinted in the solvent-cast polymer resist via hot-embossing nanoimprint lithography. Using polydimethylsiloxane stamps, it is possible to replicate the original pattern on the resist. The interference lithography process and the master structures are discussed. Lines and dots are hot-embossed applying different holding pressures, achieving a period of 630 nm.