Meßtechnik und Analytik für Halbleiterfertigungsgeräte

Future generations of semiconductor devices require lower tolerances in manufacturing and, therefore, improved epuipment with in situ and on-line measurement and control systems for improved process control. The paper outlines requirements and approaches for such systems. Another important aspect for equipment manufacturers and users is control of interactions between equipment manufacturers and users is control of interactions between equipment, media, and wafers. Examples are given for effects and analytical methods for characterization of molecular contamination in semiconductor manufacturing.