Vertical aligned carbon nanotube deposition on metallic substrates by CVD

Vertical aligned carbon nanotube (CNT) films are promising candidates for electrode surfaces in super capacitors suitable for electric energy storage. The CNT films provide a matrix with low internal resistance and a directed pore system for fast ion diffusion, both being crucial for high power supercap devices. The contribution describes the deposition process and properties of multiwalled and single walled CNTs on various metallic substrates by thermal CVD. Up to 100 micron thick, well-aligned CNT films were obtained on Ni-substrates. For steel substrates CNT forests with heights up to 20 micron were observed. The influence of several parameters on the CNT morphology was investigated.