E-beam two-coordinate measuring tool for high precision metrology in micro-lithographie

Design criteria and performance data for the E-Beam Measuring Tool (EBMT-5; Cambridge Instruments Ltd.) are presented. Repeatability tests give positional accuracies of 3 sigma <or=0.085 mu m. The maximum measurable area is 105 mm*105 mm on substrates up to 125 mm*125 mm. The effect of signal contrast on mark detection has been investigated for 4 typical mark types. Distortion measurements have been performed on X-ray masks before and after etching to a 2 mu m thick Si-foil.