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  4. Surface passivation of black silicon by thermal ALD deposited aluminum oxide
 
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2011
Conference Paper
Title

Surface passivation of black silicon by thermal ALD deposited aluminum oxide

Abstract
Black silicon (bSi) surfaces can be effectivly passivated by thermal ALD. The nanosturcures with aspect ratios up to 10 show excellent anti-reflection and light-trapping properties with absorption in the visible spectrum of over 97%.
Author(s)
Otto, M.
Kroll, M.
Käsebier, T.
Ernst, M.
Salzer, R.
Wehrspohn, R.B.
Mainwork
Solid-state and organic lighting  
Conference
Conference "Solid-State and Organic Lighting" (SOLED) 2011  
Renewable Energy and the Environment Congress 2011  
Open Access
DOI
10.1364/E2.2011.JWE7
Additional link
Full text
Language
English
IWM-H  
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