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2000
Journal Article
Title

CVD-Diamanttechnologie mit der Heißdraht-Aktivierung

Other Title
CVD diamond technology with hot-filament activation
Abstract
In this contribution technological developments in the field of polycrystalline diamond film deposition using hot-filament activated CVD processes are described. The aims of these developments focus on machining applications where products have already been introduced into market and on relatively new applications in the field of electrochemistry, respectively. The work is motivated on the one hand by trends in materials machining like high speed cutting and dry machining of new, difficult-to-machine light weight materials. On the other hand doped, conducting diamonds films exhibit new eletrochemical properties beside their extreme chemical interness. As demonstrated by examples these properties open new perspectives in the fields of water treatment, electroplating and electrochemical synthesis.
Author(s)
Schäfer, L.
Journal
Vakuum in Forschung und Praxis  
DOI
10.1002/1522-2454(200008)12:4<236::AID-VIPR236>3.0.CO;2-3
Language
German
Fraunhofer-Institut für Schicht- und Oberflächentechnik IST  
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