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  4. Enhanced Behavioral Modeling for Short-Circuit Ruggedness Analysis in GaN-Based Half-Bridge
 
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2025
Journal Article
Title

Enhanced Behavioral Modeling for Short-Circuit Ruggedness Analysis in GaN-Based Half-Bridge

Abstract
Gallium nitride (GaN) transistors are gaining popularity in industrial and automotive applications due to their ability to achieve high power density and higher efficiency. However, their reliability and robustness still pose limitations to their widespread adoption. Short-circuit (SC) robustness has been widely studied in the literature using experimental characterizations. However, less attention has been drawn to the simulation of GaN high-electron-mobility transistors (GaN HEMTs) operating in SC conditions due to the absence of accurate models that can fully describe the main phenomena impacting the SC behavior of a GaN device, such as drain current collapse and gate-leakage current increasing. In this context, this work proposes a behavioral model for the drain and gate current of a 650-V/60-A GaN HEMT, which is integrated into the manufacturer model of the device in the LTSpice simulation environment. The proposed model shows a valuable accuracy improvement in determining drain and gate currents during the SC of a GaN half-bridge (HB), as demonstrated by comparing simulations and experimental tests performed on a hardware prototype in different operating conditions. It is also demonstrated that the model can be applied to other 650-V GaN HEMTs, becoming a reliable instrument to simulate the device and to design an effective SC protection circuit.
Author(s)
Palazzo, Simone
Universita di Cassino e del Lazio Meridionale
Pereira, Thiago Antonio
Christian-Albrechts-Universität zu Kiel
Pascal, Yoann
Fraunhofer-Institut für Siliziumtechnologie ISIT  
Busatto, Giovanni
Universita di Cassino e del Lazio Meridionale
Liserre, Marco
Christian-Albrechts-Universität zu Kiel
Journal
IEEE Journal of Emerging and Selected Topics in Power Electronics  
Funder
European Commission  
DOI
10.1109/JESTPE.2025.3573517
Language
English
Fraunhofer-Institut für Siliziumtechnologie ISIT  
Keyword(s)
  • Behavioral model

  • gallium nitride high-electron-mobility transistor (GaN HEMT)

  • gate-leakage current

  • short-circuit (SC) modeling

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