Properties of TiO2 films deposited by bipolar reactive HiPIMS

TiO2 films are deposited with partial pressure controlled bipolar high power impulse magnetron sputtering (HiPIMS) sputtering. By the reduction and control of the oxygen partial pressure, the deposition rate could be increased by a factor of 3 compared to the oxide mode. A high index of refraction (n> 2.6 at 550 nm) formerly observed in transition mode at higher deposition rates. The high refractive index in also is agreement with XRD measurements, which shows a pronounced rutile phase. An increased absorption is also observed by optical analysis.