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  4. How to etch the optimal silicon trench - profile development and process discussion
 
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1992
Conference Paper
Title

How to etch the optimal silicon trench - profile development and process discussion

Author(s)
Pilz, W.
Grandorff, K.
Pelka, J.
Janes, J.
Mainwork
Dry etch technology  
Conference
Conference "Dry Etch Technology" 1991  
Language
English
Fraunhofer-Institut für Siliziumtechnologie ISIT  
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