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  4. Tunability of Ferroelectric Hafnium Zirconium Oxide for Varactor Applications
 
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2021
Journal Article
Title

Tunability of Ferroelectric Hafnium Zirconium Oxide for Varactor Applications

Abstract
In this article, we present the capacitance-voltage ( C - V ) characteristics of Hf x Zr 1−x O 2 metal-ferroelectric-metal (MFM) thin-film capacitors with various Zr doping, thicknesses, and annealing temperatures. The influence of doping, electric field cycling, and annealing temperature on tuning characteristics (tunability) was analyzed and an optimized bias region for the maximum tunability was defined. Additional focus was made on an antiferroelectric-like (AFE) behavior, which occurs for > 50% Zr doping. The presence of both the ferroelectric and the AFE phase manifests itself in specific C - V behavior, where a reduced bias range is required for tuning, however, at the cost of a smaller tunability. The suitability of this behavior for varactor applications is also discussed.
Author(s)
Abdulazhanov, S.
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Lederer, M.
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Lehninger, D.
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Mart, C.
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Ali, T.
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Wang, D.
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Olivo, R.
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Emara, J.
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Kämpfe, T.
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Gerlach, G.
Journal
IEEE transactions on electron devices  
DOI
10.1109/TED.2021.3104532
Language
English
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
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