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Roughness improvement of the COSi2/Si-interface for an application as buried silicide
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2007
Conference Paper
Title
Roughness improvement of the COSi2/Si-interface for an application as buried silicide
Author(s)
Zimmermann, S.
Zhao, Q.T.
Höhnemann, H.
Wiemer, M.
Kaufmann, C.
Mantl, S.
Dudek, V.
Gessner, T.
Mainwork
Materials for advanced metallization, MAM 2007
Conference
European Workshop on Materials for Advanced Metallization (MAM) 2007
DOI
10.1016/j.mee.2007.05.056
Language
English
Fraunhofer-Institut für Elektronische Nanosysteme ENAS
Fraunhofer-Institut für Zuverlässigkeit und Mikrointegration IZM