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  4. Roughness improvement of the COSi2/Si-interface for an application as buried silicide
 
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2007
Conference Paper
Title

Roughness improvement of the COSi2/Si-interface for an application as buried silicide

Author(s)
Zimmermann, S.
Zhao, Q.T.
Höhnemann, H.
Wiemer, M.
Kaufmann, C.
Mantl, S.
Dudek, V.
Gessner, T.
Mainwork
Materials for advanced metallization, MAM 2007  
Conference
European Workshop on Materials for Advanced Metallization (MAM) 2007  
DOI
10.1016/j.mee.2007.05.056
Language
English
Fraunhofer-Institut für Elektronische Nanosysteme ENAS  
Fraunhofer-Institut für Zuverlässigkeit und Mikrointegration IZM  
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