Efficient Silicon Device Simulation with the Local Iterative Monte Carlo Method

The Local Iterative Monte Carlo technique (LIMO) is used for an effective simulation of hot electron distributions in silicon MOSFETs. This new Monte Carlo approach yields an efficient use of the computational resources due to a different iteration scheme. In addition the necessary computation time can be further reduced by a reuse of the computational expensive MC step simulation results in the iteration process. The later possibility is investigated in detail in this work. Results for short channel MOSFETs demonstrates that correct two-dimensional hot electron distributions can be calculated by LIMO within I hour on a standard work station.