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  4. Advanced detection method for polymer residues on semiconductor substrates
 
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2016
Conference Paper
Title

Advanced detection method for polymer residues on semiconductor substrates

Title Supplement
3D/TSV/interposer. Through silicon via and packaging
Abstract
A novel inspection technology for detection of thin polymer layers, deposited on structured silicon wafer surfaces, has been developed. The labeling of polymer residues with fluorophore combined with the subsequent examination under a fluorescence microscope enables a non-destructive detection of amorphous and semi-crystalline polymers and polymer residues on wafer substrates.
Author(s)
Richter, H.
Pfitzner, L.
Pfeffer, M.  
Bauer, A.
Siegert, J.
Bodner, T.
Mainwork
2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC). Proceedings  
Conference
Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) 2016  
DOI
10.1109/ASMC.2016.7491098
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
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