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Different pulse techniques for stationary reactive sputtering with double ring magnetron
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1999
Journal Article
Title
Different pulse techniques for stationary reactive sputtering with double ring magnetron
Author(s)
Bartzsch, H.
Frach, P.
Goedicke, K.
Gottfried, C.
Journal
Surface and coatings technology
DOI
10.1016/S0257-8972(99)00365-5
Language
English
Fraunhofer-Institut für Elektronenstrahl- und Plasmatechnik FEP
