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  4. VUV - visible emission from plasmas of high-purity gases and gas mixtures
 
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1995
Conference Paper
Titel

VUV - visible emission from plasmas of high-purity gases and gas mixtures

Alternative
VUV-VIS Emission von Plasmen hochreiner Gase und Gasmischungen
Abstract
A microwave plama system incorporating two separate spectrophotometric instruments has been used to study optical emission spectra from various pure gases and gas mixtures in the range 100 about lambda about 900 nm. For the particular case of oxygen plasma, we here report the dependence of various spectral features on plasma parameters, particularly power, pressure, and gas flow rate. Mixtures with noble gases can lead to very intense VUV emissions, which is potentially useful for the photochemical treatment of polymer surfaces.
Author(s)
Kruse, A.
Fozza, A.
Wertheimer, M.R.
Hauptwerk
CIP '95. Proceedings of the 10th International Colloquium on Plasma Processes
Konferenz
International Colloquium on Plasma Processes 1995
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Language
English
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Fraunhofer-Institut für Fertigungstechnik und Angewandte Materialforschung IFAM
Tags
  • low pressure plasma

  • optical emission spec...

  • polymer treatment

  • VUV radiation

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