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Plasma etching of SnO2: F films at atmospheric pressure for silicon thin film solar cells
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2010
Conference Paper
Title
Plasma etching of SnO2: F films at atmospheric pressure for silicon thin film solar cells
Title Supplement
Abstract
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Author(s)
Lopez, E.
Dresler, B.
Leupolt, B.
Dani, I.
Kaskel, S.
Beyer, E.
Mainwork
Nanofair 2010, 8th International Nanotechnology Symposium. Abstractband
Conference
International Nanotechnology Symposium (Nanofair) 2010
Language
English
Fraunhofer-Institut für Werkstoff- und Strahltechnik IWS