NANO-motheye antireflection pattern by plasma treatment of polymers

The application of plasma treatment on transparent PMMA substrates has shown an effect of reducing surface reflection. This effect is based on a refractive index gradient created by a combination of chemical decomposition and physical etching on the polymer surface. A stochastic nanostructure was found by means of AFM and SEM. Conditions for the plasma treatment process and properties of the modified PMMA surfaces have been discussed.