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  4. Temperature dependence of excitonic photoluminescence and residual shallow donors in high-purity GaN/Al2O3
 
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1997
Journal Article
Title

Temperature dependence of excitonic photoluminescence and residual shallow donors in high-purity GaN/Al2O3

Other Title
Temperaturabhängigkeit der exzitonischen Photolumineszenz und residuäre flache Akzeptoren in GaN/Al2O3
Abstract
The temperature dependence of free and bound exciton lines in high-purity, undoped wurtzite GaN layers has been studied by photoluminescence (PL) between 2 and 300 K. Below 30 K the neutral donor bound exciton D deg X produces the strongest near band gap PL signal whereas free A and B excitons dominate the spectrum at room temperature. A deconvolution of the asymmetric D deg X line shape provides strong evidence for two residual shallow donors differing in ionisation energies by a factor of 1.5. The origin of a PL line occurring at Eg = 116 meV is discussed in two alternative models.
Author(s)
Merz, C.
Kunzer, Michael  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Santic, B.
Kaufmann, U.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Akasaki, I.
Amano, H.
Journal
Materials Science and Engineering, B. Solid state materials for advanced technology  
DOI
10.1016/S0921-5107(96)01858-2
Language
English
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Keyword(s)
  • exciton

  • Exziton

  • flacher Donator

  • GaN

  • photoluminescence

  • Photolumineszenz

  • shallow donor

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