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  4. Assessment of a FOUP conditioning equipment for advanced semiconductor application
 
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2012
Conference Paper
Title

Assessment of a FOUP conditioning equipment for advanced semiconductor application

Abstract
The effectiveness of a FOUP (Front Opening Unified Pod) conditioning test bench was tested with respect to the reduction of outgassing materials from FOUP materials and cleanroom compatibility. The equipment uses vacuum and heat to reduce volatile organic compounds from construction material and wafers. Five different analysis methods were used to asses the performance of the equipment with respect to organic, ionic and metal contamination. The experiments showed that the use of heat and vacuum has a positive effect on the organic contamination from FOUPs, and that the equipment is suitable for semiconductor applications in cleanroom environments.
Author(s)
Otto, M.
Rioufrays, S.
Favre, A.
Leibold, A.
Altmann, R.
Gennaro, S.
Dell'Anna, R.
Canteri, R.
Pfitzner, L.
Mainwork
Ultra clean processing of semiconductor surfaces X  
Conference
International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) 2010  
DOI
10.4028/www.scientific.net/SSP.187.299
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
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