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  4. THz frequency HEMTs: Future trends and applications
 
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2019
Conference Paper
Title

THz frequency HEMTs: Future trends and applications

Abstract
In recent years the outstanding RF performance of InGaAs high electron mobility transistors (HEMTs) could be further improved by rigorous scaling the gate length of the devices down to 20 nm. Examples of applications in 300 GHz communication and radar systems as well as cryogenic receivers are presented. Due to the reduced gate to channel separation the HEMT has entered the quantum regime where the tunneling effect starts to dominate the device characteristics and preclude further device improvements. To overcome this quantum limit of the classical HEMT, Fraunhofer IAF has started to investigate InGaAs channel MOSHEMTs where the metal/semiconductor Schottky barrier is replaced by an oxide layer to suppress the tunneling leakage currents. This approach combines the the excellent high frequency performance of III/V semiconductors with the superior characteristics of the oxide gate barrier as used in Silicon MOSFETs.
Author(s)
Leuther, Arnulf  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Merkle, Thomas  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Weber, Rainer  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Sommer, Rainer  
Fraunhofer-Institut für Hochfrequenzphysik und Radartechnik FHR  
Tessmann, Axel  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Mainwork
Compound Semiconductor Week, CSW 2019. Proceedings  
Conference
Compound Semiconductor Week 2019  
DOI
10.1109/ICIPRM.2019.8819000
Language
English
Fraunhofer-Institut für Hochfrequenzphysik und Radartechnik FHR  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Keyword(s)
  • InGaAs

  • HEMT

  • MMIC

  • MOSHEMT

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