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Low damage reactive ion etching for photovoltaik applications
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1999
Journal Article
Title
Low damage reactive ion etching for photovoltaik applications
Author(s)
Schaefer, Sebastian
Lüdemann, Ralf
Journal
Journal of vacuum science and technology A. Vacuum, surfaces and films
DOI
10.1116/1.581644
Language
English
Fraunhofer-Institut für Solare Energiesysteme ISE
