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High-rate deposition of MgO by reactive ac pulsed magnetron sputtering in the transition mode
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2006
Journal Article
Title
High-rate deposition of MgO by reactive ac pulsed magnetron sputtering in the transition mode
Author(s)
Kupfer, H.
University of Technology, Chemnitz
Kleinhempel, R.
University of Technology, Chemnitz
Richter, F.
University of Technology, Chemnitz
Peters, C.
Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP
Krause, U.
Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP
Kopte, T.
Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP
Cheng, Y.
University of Texas at Arlington
Journal
Journal of vacuum science and technology A. Vacuum, surfaces and films
DOI
10.1116/1.2138717
Language
English
Fraunhofer-Institut für Elektronenstrahl- und Plasmatechnik FEP
Keyword(s)
high rate
magnetron sputtering