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Integration of high dielectric Ba0.5Sr0.5TiO3 films into amorphous TaSiN barrier layer structures
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2002
Journal Article
Title
Integration of high dielectric Ba0.5Sr0.5TiO3 films into amorphous TaSiN barrier layer structures
Author(s)
Wenger, C.
Albert, M.
Adolphi, B.
Heuer, H.
Bartha, J.W.
Schlenkrich, F.
Journal
Materials Science in Semiconductor Processing
DOI
10.1016/S1369-8001(02)00079-3
Language
English
Fraunhofer-Institut für Keramische Technologien und Systeme IKTS