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  4. Integration of GaN HEMTs onto silicon CMOS by micro transfer printing
 
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2016
Conference Paper
Title

Integration of GaN HEMTs onto silicon CMOS by micro transfer printing

Abstract
Integration of GaN high voltage transistors into Silicon CMOS could combine superior electrical parameters of GaN HEMTs and the huge logic functionality of Silicon CMOS. Several issues of a monolithic integration of GaN devices into CMOS like material mismatch and thermal budgets can be overcome by heterogeneous integration by micro Transfer Printing. Results of first printing experiments with small GaN on Si HEMTs are presented.
Author(s)
Lerner, R.
Eisenbrandt, S.
Bower, C.
Bonafede, S.
Fecioru, A.
Reiner, Richard  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Waltereit, Patrick  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Mainwork
28th International Symposium on Power Semiconductor Devices & ICs, ISPSD 2016. Proceedings  
Conference
International Symposium on Power Semiconductor Devices and ICs (ISPSD) 2016  
DOI
10.1109/ISPSD.2016.7520875
Language
English
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Keyword(s)
  • heterogeneous integration

  • micro Transfer Printing

  • GnA on CMOS

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