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  4. Distortion measurements on pure-silicon and siliconplastic X-ray masks
 
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1981
Conference Paper
Title

Distortion measurements on pure-silicon and siliconplastic X-ray masks

Other Title
Verzugsmessungen an Reinsiliziummasken und Silizium-Plastikmasken fuer die Roentgenlithographie
Author(s)
Triantafyllou, M.
Betz, H.
Heuberger, A.
Tischer, P.
Mainwork
Microcircuit Engineering 81. Proceedings of the International Conference on Microlithography  
Conference
International Conference on Microlithography 1981  
Language
English
IFT  
Keyword(s)
  • Lithographie

  • Lithographiemaske

  • Maskenverzerrung

  • Röntgenstrahlen

  • Silizium

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