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Optimized wetting behavior of water-based cleaning solutions for plasma etch residue removal by application of surfactants
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2010
Conference Paper
Title
Optimized wetting behavior of water-based cleaning solutions for plasma etch residue removal by application of surfactants
Author(s)
Ahner, N.
Zimmermann, Sven
Schaller, M.
Schulz, Stefan E.
Mainwork
10th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2010. Proceedings
Conference
International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) 2010
Language
English
Fraunhofer-Institut für Elektronische Nanosysteme ENAS
