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  4. Manufacture of specific structure of aluminum-doped zinc oxide films by patterning the substrate surface
 
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2002
Journal Article
Title

Manufacture of specific structure of aluminum-doped zinc oxide films by patterning the substrate surface

Abstract
(0001)-oriented aluminum-doped zinc oxide films were prepared using a magnetron sputtering technique. High-resolution transmission-electron- microscopic images show that the oriented grains nucleate directly on the substrate surface and grow with equal lateral dimensions through the film thickness. A surface-energy-driven self-texture mechanism was proposed on the basis of process modes. A method for manufacturing specific film structure by patterning the substrate surface is tested and discussed.
Author(s)
Jiang, X.
Fraunhofer-Institut für Schicht- und Oberflächentechnik IST  
Jia, C.L.
Szyszka, B.
Journal
Applied Physics Letters  
DOI
10.1063/1.1473683
Language
English
Fraunhofer-Institut für Schicht- und Oberflächentechnik IST  
Keyword(s)
  • magnetron sputtering technique

  • substrate surface

  • film thickness

  • texture formation

  • Si

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