2010
Conference Paper
Title

Patterning of deep silicon trenches using a novel hardmask concept with ultra-thin E-Beam resist

Title Supplement
Abstract
Author(s)
Paul, J.
Fraunhofer-Center Nanoelektronische Technologien CNT  
Riedel, S.
Fraunhofer-Center Nanoelektronische Technologien CNT  
Wege, S.
Plasway
Beyer, V.
Fraunhofer-Center Nanoelektronische Technologien CNT  
Kücher, P.
Fraunhofer-Center Nanoelektronische Technologien CNT  
Mainwork
Conference
Language
English