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Novel surface imaging process with ion-beam lithography and dry development
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1992
Conference Paper
Title
Novel surface imaging process with ion-beam lithography and dry development
Author(s)
Jadghold, U.A.
Buchmann, L.-M.
Pilz, W.
Torkler, M.
Mainwork
Electron-beam, x-ray, and ion-beam submicrometer lithographies for manufacturing II
Conference
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing Conference 1992
Language
English
Fraunhofer-Institut für Siliziumtechnologie ISIT
