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  4. Light switched plasma charging damage protection device allowing high field characterization
 
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2009
Conference Paper
Title

Light switched plasma charging damage protection device allowing high field characterization

Abstract
One of the main problems in Plasma Charging Damage (PCD) measurement is the need to reference the measured damage to a zero level. Especially when the reference device is small it can not be created damage free without a protective device parallel to the gate. Normally such a device does not allow destructive measurement involving high fields and both polarities. This paper describes a structure, which is capable of protecting a device from PCD, but at the same time allows bipolar high-field diagnostic stress after the end of the process. Its usefulness is demonstrated on a realistic PCD test structure.
Author(s)
Sommer, S.P.
Fraunhofer-Institut für Mikroelektronische Schaltungen und Systeme IMS  
Paschen, U.
Fraunhofer-Institut für Mikroelektronische Schaltungen und Systeme IMS  
Figge, M.
Fraunhofer-Institut für Mikroelektronische Schaltungen und Systeme IMS  
Vogt, H.
Fraunhofer-Institut für Mikroelektronische Schaltungen und Systeme IMS  
Mainwork
ESSDERC / ESSCIRC 2009. CD-ROM  
Conference
European Solid-State Device Research Conference (ESSDERC) 2009  
DOI
10.1109/ESSDERC.2009.5331445
Language
English
Fraunhofer-Institut für Mikroelektronische Schaltungen und Systeme IMS  
Keyword(s)
  • plasma damage

  • gateoxide

  • damage protection

  • wafer level reliability

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