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2002
Journal Article
Title

High-performance deep-ultraviolet optics for free-electron lasers

Abstract
Working with wavelengths shorter than the deep ultraviolet involves the development of dedicated optics for free-electron lasers with devoted coating techniques and characterizations. High-performance deep- ultraviolet optics are specially developed to create low-loss, high- reflectivity dielectric mirrors with long lifetimes in harsh synchrotron radiation environments. In February 2001, lasing at 189.7 nm, the shortest wavelength obtained so far with free-electron-laser oscillators, was obtained at the European Free-electron-laser project at ELETTRA Synchrotron Light Laboratory, Trieste, Italy. In July 2001, 330- mW extracted power at 250 nm was measured with optimized transmission mirrors. Research and development of coatings correlated to lasing performance are reported.
Author(s)
Gatto, A.
Thielsch, R.
Heber, J.
Kaiser, N.
Ristau, D.
Günster, S.
Kohlhaas, J.
Marsi, M.
Trovo, M.
Walker, R.
Garzella, D.
Couprie, M.E.
Torchio, P.
Alvisi, M.
Amra, C.
Journal
Applied optics  
DOI
10.1364/AO.41.003236
Language
English
Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF  
Keyword(s)
  • high-performance deep-ultraviolet optic

  • free-electron lasers

  • coating technique

  • low loss high reflectivity dielectric mirror

  • long lifetime

  • harsh synchrotron radiation environment

  • free-electron-laser oscillator

  • extracted power

  • optimized transmission mirror

  • optical coating

  • X-ray optic

  • lasing performance

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