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  4. Multi-stage cascode in high-voltage AlGaN/GaN-on-Si technology
 
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2018
Conference Paper
Title

Multi-stage cascode in high-voltage AlGaN/GaN-on-Si technology

Abstract
This work investigates a new approach of a multistage cascode. The concept is applied as intrinsic structure in an AlGaN/GaN-on-Si technology. The fabricated device achieves an off-state voltage >600 V and an on-state resistance of 14 O mm. A special pull-down pin is connected to the source of the highest segments. This pin can be used for characterization and is intended to drive further stacked cascade segments. Thus, integrated multi-stage cascodes are found suitable as flexible device for high voltage applications.
Author(s)
Reiner, Richard  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Waltereit, Patrick  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Mönch, Stefan  orcid-logo
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Dammann, Michael  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Weiss, Beatrix
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Quay, Rüdiger  orcid-logo
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Ambacher, Oliver  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Mainwork
6th Annual IEEE Workshop on Wide Bandgap Power Devices & Applications, WiPDA 2018  
Conference
Workshop on Wide Bandgap Power Devices and Applications (WiPDA) 2018  
DOI
10.1109/WiPDA.2018.8569168
Language
English
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Keyword(s)
  • power transistors

  • gallium nitride

  • cascode circuit

  • monolithic integration

  • field plate

  • high-voltage devices

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