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  4. AlGaN/GaN HEMTs on silicon carbide substrates for microwave power operation
 
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2003
Conference Paper
Title

AlGaN/GaN HEMTs on silicon carbide substrates for microwave power operation

Other Title
AlGaN/GaN HEMTs auf SiC-Substraten für Leistungsanwendungen im Mikrowellenbereich
Abstract
Results from technology and microwave characterization of large periphery AlGaN/GaN power HEMTs on insulating SiC substrates are presented. The influence of processing steps on device performance is discussed. DC characteristics reveal current densities above 1.2 A/mm and extrinsic transconductances of 275 mS/mm. A power density of 5.2 W/mm @ 2 GHz is obtained for devices up to 2 mm gate width. The maximum power level achieved on-wafer is 13.8 W @ 2 GHz for 4 mm wide devices. A hybrid amplifier using packaged 4 mm devices delivers 15.1 W.
Author(s)
Lossy, R.
Chaturvedi, N.
Heymann, P.
Köhler, Klaus  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Müller, Stefan
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Würfl, J.
Mainwork
GaAs Mantech 2003. Proceedings  
Conference
International Conference on Compound Semiconductor MANufacturing TECHnology (GaAs MANTECH) 2003  
Language
English
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Keyword(s)
  • III-V Halbleiter

  • III-V semiconductor

  • heterostructure

  • Heterostruktur

  • electron

  • device

  • elektrisch

  • Bauelement

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