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  4. Reliable high-density energy storage in Si-doped HfO2 thin films on 3D-structures
 
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2018
Presentation
Title

Reliable high-density energy storage in Si-doped HfO2 thin films on 3D-structures

Title Supplement
Presentation held at Wodim 2018, 20th Workshop on Dielectrics in Microelectronics, 11 - 14 June 2018, Berlin, Germany
Author(s)
Kühnel, Kati  
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Riedel, Stefan
Fraunhofer-Institut für Molekularbiologie und Angewandte Oekologie IME  
Mart, Clemens
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Weinreich, Wenke  
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Conference
Workshop on Dielectrics in Microelectronics 2018  
Request publication:
bibliothek@ipms.fraunhofer.de
Language
English
Fraunhofer-Institut für Molekularbiologie und Angewandte Oekologie IME  
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
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