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  4. AlGaInP/GaInAs/GaAs MODFET devices with self-aligned p+ -GaAs gate structure.
 
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1994
Conference Paper
Title

AlGaInP/GaInAs/GaAs MODFET devices with self-aligned p+ -GaAs gate structure.

Other Title
AlGaInP/GaInAs/GaAs MODFET-Bauelemente mit selbstjustiertem p+ -GaAs-Gate
Abstract
A self-aligned fabrication scheme of a novel AlGaInP/GaInAs/GaAs-MODFET device has been developed. Two characteristic features have been incorporated in the device structure: An AlGaInP barrier which provides a larger conduction band offset than the commonly used AlGaAs and a highly carbon-doped p-type GaAs gate structure which supports a very simple fabrication scheme. Using 1mym optical lithography we have fabricated first demonstrator devices with a current gain cut-off frequency of 60 GHz and a power gain cut-off frequency of 140 GHz. In addition, the devices show large gate-drain diode breakdown voltages in excess of 30 V and gate currents as low as 50 nA even at gatesource voltages of -5 V.
Author(s)
Pletschen, Wilfried  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Bachem, K.H.
Tasker, P.J.
Winkler, K.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Mainwork
Growth, processing and characterization of semiconductor heterostructures  
Conference
Materials Research Society (Symposium) 1993  
Language
English
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Keyword(s)
  • AlGaInP/GaInAs/GaAs heterostructure

  • AlGaInP/GaInAs/GaAs Heterostruktur

  • carbon doping

  • chemical vapour deposition

  • Kohlenstoffdotierung

  • MOCVD

  • MODFET

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