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  4. Broadband reflective spectrometer for high-resolution spectral characterization of radiation sources
 
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November 21, 2024
Conference Paper
Title

Broadband reflective spectrometer for high-resolution spectral characterization of radiation sources

Abstract
The development of compact radiation sources for extreme ultraviolet (EUV) radiation has enabled a multitude of lab-size applications, especially in the field of metrology, that were previously only possible at synchrotron facilities. Plasma-based and high-harmonic generation (HHG) sources are widely used and well characterized at their application specific wavelength ranges in the EUV regime. The spectrum of the emitted radiation from these sources extends to a broader wavelength range, even into the visible and infrared bands and their full spectral composition is not sufficiently characterized. Therefore, a broadband spectral characterization of the source emission is of utmost importance for the investigation of photon-induced processes and metrology. In this study, the authors present a unique setup and corresponding measurement results for the high-resolution broadband spectral characterization of radiation sources covering the extensive wavelength range from 5nm to 1μm. For the vacuum wavelength range (5nm to 200nm) the setup employs a combination of three flat-field diffraction gratings with varying line density as dispersive elements. Higher diffraction orders are filtered out by a selection of thin film filters. The wavelength range above 200nm is measured with two Czerny-Turner spectrometer modules. The resulting spectra are combined to obtain the full spectrum without any contributions from higher diffraction orders. Here, the overall design, wavelength calibration, and the relative and absolute intensity calibration of the measured spectra are presented.
Author(s)
Gisch, Ismael
Fraunhofer-Institut für Lasertechnik ILT  
Schröder, Sophia  
RWTH Aachen University
Glabisch, Sven  
RWTH Aachen University
Brose, Sascha  
RWTH Aachen University
Danylyuk, Serhiy  
Fraunhofer-Institut für Lasertechnik ILT  
Stollenwerk, Jochen  
Fraunhofer-Institut für Lasertechnik ILT  
Holly, Carlo  
Fraunhofer-Institut für Lasertechnik ILT  
Mainwork
International Conference on Extreme Ultraviolet Lithography 2024  
Conference
International Conference on Extreme Ultraviolet Lithography 2024  
DOI
10.1117/12.3034671
Language
English
Fraunhofer-Institut für Lasertechnik ILT  
Keyword(s)
  • Spectroscopy

  • Reflection

  • Diffraction gratings

  • Optical filters

  • Tunable filters

  • Calibration

  • CCD image sensors

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