• English
  • Deutsch
  • Log In
    Password Login
    Research Outputs
    Fundings & Projects
    Researchers
    Institutes
    Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Konferenzschrift
  4. Quality and applications of In(Ga)AlAs-layers
 
  • Details
  • Full
Options
1989
Conference Paper
Title

Quality and applications of In(Ga)AlAs-layers

Abstract
In the last few years the InGaAlAs material system has received increasing interest for application in integrated optoelectronic devices. The authors present an analysis of layer and surface quality of MBE-grown InAlAs material, a systematic improvement of Schottky contacts characterized by electrical measurements and finally, the fabrication of MeSFET (Metal Semiconductor Field Effect Transistors), DHBT (Double Heterostructure Bipolar Transistors) and rib waveguide devices.
Author(s)
Schramm, C.
Kunzel, H.
Bornholdt, C.
Su, L.M.
Wehmann, H.H.
Mainwork
ESSDERC '89. 19th European Solid State Device Research Conference. Proceedings  
Conference
European Solid State Device Research Conference 1989  
Language
English
Fraunhofer-Institut für Nachrichtentechnik, Heinrich-Hertz-Institut HHI  
Keyword(s)
  • aluminium compounds

  • heterojunction bipolar transistors

  • iii-v semiconductors

  • indium compounds

  • molecular beam epitaxial growth

  • optical waveguides

  • schottky effect

  • schottky gate field effect transistors

  • semiconductor growth

  • mbe growth

  • mesfet

  • double heterostructure bipolar transistors

  • integrated optoelectronic devices

  • surface quality

  • schottky contacts

  • electrical measurements

  • rib waveguide devices

  • ingaalas material system

  • inalas

  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Contact
© 2024