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  4. Investigation of Wafer-Level Fabricated Permanent Micromagnets for MEMS
 
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2022
Journal Article
Title

Investigation of Wafer-Level Fabricated Permanent Micromagnets for MEMS

Abstract
Monolithic integration of permanent micromagnets into MEMS structures offers many advantages in magnetic MEMS applications. A novel technique called PowderMEMS, based on the agglomeration of micron-sized powders by atomic layer deposition (ALD), has been used to fabricate permanent micromagnets on 8-inch wafers. In this paper, we report the fabrication and magnetic characterization of PowderMEMS micromagnets prepared from two different NdFeB powder particle sizes. A remanence of 423 mT and intrinsic coercivity of 924 mT is achieved at the low ALD process temperature of 75 °C, making this process compatible with MEMS technology. The magnetic reversible mechanism in the micromagnets is discussed with the help of the Wohlfarth equation. To ensure the operability of such integrated micromagnets in different application environments, we conducted a set of experiments to systematically investigate the thermal and corrosive stability. NdFeB micromagnets with larger powder particle size (d50 = 25 μm) exhibit high thermal stability in air. Furthermore, the corrosion stability of the micromagnets is significantly improved by an additional silicon oxide passivation layer deposited by plasma-enhanced chemical vapor deposition (PECVD). The presented results demonstrate the durability of PowderMEMS micromagnets, enabling their application in various fields, e.g., microfluidics, sensors, actuators, and microelectronics.
Author(s)
Bodduluri, Mani Teja
Fraunhofer-Institut für Siliziumtechnologie ISIT  
Gojdka, Björn
Fraunhofer-Institut für Siliziumtechnologie ISIT  
Wolff, N.
Kiel University
Kienle, L.
Kiel University
Lisec, Thomas  
Fraunhofer-Institut für Siliziumtechnologie ISIT  
Lofink, Fabian  
Fraunhofer-Institut für Siliziumtechnologie ISIT  
Journal
Micromachines  
Open Access
DOI
10.3390/mi13050742
Additional link
Full text
Language
English
Fraunhofer-Institut für Siliziumtechnologie ISIT  
Keyword(s)
  • Atomic layer deposition

  • Integrated rare-earth micromagnets

  • Magnetic MEMS

  • NdFeB

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