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Effect of the substrate temperature on the structure and properties of Al2O3 layers reactively deposited by pulsed magnetron sputtering
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1996
Journal Article
Title
Effect of the substrate temperature on the structure and properties of Al2O3 layers reactively deposited by pulsed magnetron sputtering
Author(s)
Zywitzki, O.
Hoetzsch, G.
Fietzke, F.
Goedicke, K.
Journal
Surface and coatings technology
DOI
10.1016/0257-8972(95)00270-7
Language
English
Fraunhofer-Institut für Elektronenstrahl- und Plasmatechnik FEP