Surface contamination of silicon wafer after acidic texturisation

The acidic texture bath that is commonly used in crystalline silicon solar cell manufacturing is a mixture of HF/HNO 3/H 2O [1]. While the influences of metal contamination on silicon wafer surfaces as well as several cleaning methods were intensively investigated in the previous 30 years [2] the effect of metal contaminations in texturisation baths has not yet been studied intensively. There are two categories of contaminations.