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Modification of the resolution limits of the photolithogaphic process due to nonlinear optical propagation effects in the resist layers
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1996
Conference Paper
Title
Modification of the resolution limits of the photolithogaphic process due to nonlinear optical propagation effects in the resist layers
Author(s)
Erdmann, A.
Mainwork
Optics for science and new technology
Conference
International Commission for Optics (Congress) 1996
Language
English
Fraunhofer-Institut für Siliziumtechnologie ISIT
