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  4. The impacts of dimensions and return current path geometry on coupling in single ended through silicon vias
 
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2009
Conference Paper
Title

The impacts of dimensions and return current path geometry on coupling in single ended through silicon vias

Abstract
Through Silicon Vias (TSVs) are expected to play an increasingly important role in next-generation microelectronics packaging. Even when the challenge of attenuation is overcome, crosstalk remains a major concern in TSV design. In this paper, it is shown that, at frequencies above 20 GHz, near-end crosstalk can easily exceed -20 dB. Traditional analytical models for crosstalk are compared to full-wave simulations to determine their limitations and a lumped element equivalent circuit model is presented. An examination of the impact of TSV dimensions is presented. Then, three TSV structures are compared and the impact of their dimensions on crosstalk is investigated.
Author(s)
Curran, B.
Ndip, I.
Guttowski, S.
Reichl, H.
Mainwork
IEEE 59th Electronic Components and Technology Conference, ECTC 2009. Vol.3  
Conference
Electronic Components and Technology Conference (ECTC) 2009  
DOI
10.1109/ECTC.2009.5074148
Language
English
Fraunhofer-Institut für Zuverlässigkeit und Mikrointegration IZM  
Keyword(s)
  • crosstalk

  • signal-integrity

  • 3D-Integration

  • silicon based module

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