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  4. Photoluminescence topography of shallow impurities in GaAs epilayers grown by metalorganic vapor phase epitaxy.
 
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1992
Journal Article
Title

Photoluminescence topography of shallow impurities in GaAs epilayers grown by metalorganic vapor phase epitaxy.

Other Title
Photolumineszenztopographie von flachen Störstellen in GaAs Epitaxieschichten, die durch metallorganische Dampfphasenepitaxie gewachsen sind
Abstract
Spectrally and spatially resolved low-temperature photoluminescence topography has been applied to investigate the lateral variation of impurities in nominally undoped epitaxial GaAs layers. The concentrations of both shallow donors and acceptors exhibit lateral variations. The donor variation pattern appears to be arbitrary, but the fluctuation of shallow acceptor carbon clearly reproduces the well-known cellular structure of the liquid encapsulated Czochralski GaAs substrate dislocation density distribution, suggesting that the carbon incorporation into the epitaxial layer is influenced by the substrate during the growth of metalorganic vapor phase epitaxy.
Author(s)
Wang, Z.M.
As, D.J.
Windscheif, J.
Bachem, K.H.
Jantz, W.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Journal
Applied Physics Letters  
DOI
10.1063/1.107216
Language
English
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Keyword(s)
  • carbon acceptor

  • Kohlenstoffakzeptor

  • lateral variation

  • laterale Verteilung

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