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1998
Journal Article
Title

Oxide layer thickness measurement

Abstract
The paper describes a novel technique suitable to measure oxide layer thickness growth inside a vertical furnace in real time. A spectroscopic ellipsometer is mounted to the base plate of a production-type furnace. The optical system consisting of light-guiding quartz prisms requires only minor modifications of the processing equipment. Moreover, the materials used are completely compatible to ultra-pure high temperature processing.
Author(s)
Schneider, C.
Journal
European Semiconductor  
Language
English
IIS-B  
Keyword(s)
  • Ellipsometrie

  • ellipsometry

  • film thickness

  • Halbleiterfertigung

  • in situ-Meßtechnik

  • in situ metrology

  • microelectronics

  • Mikroelektronik

  • Ofentechnik

  • oxidation

  • oxide layer

  • Oxidschicht

  • Schichtdicke

  • semiconductor manufacturing

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