Pulsed arc deposition of super-hard amorphous carbon films

Schulz, H.; Scheibe, H.-J.; Siemroth, P.; Schultrich, B.

doi:10.1007/s00339-003-2280-8

2004

Journal Article

Abstract

Hydrogen-free amorphous carbon films with hardness up to 75 GPa have been deposited by special pulsed arc techniques. The influence of plasma and deposition conditions on the film properties is discussed and some applications are shown.

Author(s)

Schulz, H.

Scheibe, H.-J.

Siemroth, P.

Schultrich, B.

Journal

Applied physics. A

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Pulsed arc deposition of super-hard amorphous carbon films